Low temperature gradients processing: the objective is to develop an innovative hybrid thermal/MW assisted technology to achieve a reduction of about one order of magnitude in manufacturing time of CMCs.

High temperature rates processing:the objective is to develop, assemble and test two MW furnaces capable for Liquid Silicon Infiltration and Graphite Exfoliation  manufacturing

Low heating rates processing:the objective is the study and development of pyrolysis/PIP processes based on EM heating.